Osela-Industrial Laser System

TEC High Power Direct Semiconductor pattern generator provides high reliability
with superior beam shaping for high signal to noise industrial applications.

DIODE MODEL			FOCUSING & DOF OPTIONS AND CONSTANT
WAVELENGTH (nm)	DIODE POWER(mW)	WAVELENGTH TOLERENCE(nm)	TYPE A		TYPE C		TYPE
			KFOCUS	KDOF	KFOCUS	KDOF	KFOCUS	KDOF
375	200	±5	0.5	0.47	0.28	0.15	0.73	1
405	100	±10	0.64	0.72	0.36	0.23	0.93	1.52
	175	±5	0.64	0.72	0.36	0.23	0.93	1.52
	500	±5	0.45	0.3	0.25	0.09	0.65	0.62
450	500	±10	0.64	0.65	0.36	0.21	0.94	1.38
	1000	±10	0.64	0.65	0.36	0.21	0.94	1.38
488	200	±5	0.65	0.62	0.37	0.19	0.94	1.3
670	5006	±10	0.95	0.81	0.53	0.26	1.37	1.7
	1000	±10	0.68	0.42	0.39	0.13	0.99	0.89
	1500	±10	0.68	0.42	0.39	0.13	0.99	0.89
810	500	±3	0.83	0.51	0.47	0.16	1.2	1.08
	1000	±3	0.83	0.51	0.47	0.16	1.2	1.08
	2000	±3	0.83	0.51	0.47	0.16	1.2	1.08
	3000	±3	0.83	0.51	0.47	0.16	1.2	1.08

OSELA_DATA_SHEET_ILSv3.pdf

• Up to 3W in a Compact Size
• Superior beam shaping
• Rugged and reliable design
• Custom-ready
• Fast turn around
• Easy focusing

1.Machine Vision
2.Industrial Inspection
3.Bio-medical